VT&C Catalogs & Literature

VT&C Vacuum Components and Systems Catalog & Literature

4 listings found for: Materials Science, Inc.

MSI SunSource™ GEN II High Utilization Linear Sputtering Sources

The Materials Science, Inc. (MSI) SunSource™ GEN II linear planar magnetron sputtering sources are available in 90mm/5”/6” wide targets and feature 40-45wt% utilization during the useful target life. They are rugged, easy to use and maintain. Available in target lengths up to 90”, they are ideal for sputtering precious metals and expensive, hard to fabricate materials. These sources are a cost-effective alternative to rotary magnetrons in many large area coating applications Good target utilization and stable, repeatable operation can be achieved even at very low power levels in addition to very high rate/high power applications. An important bene t is that there is virtually no center material re-deposition. Target erosion is uniform throughout the target lifetime without significant changes in distribution uniformity as the target erodes. There are no “wiggles” down the length of the racetrack and no premature burn-through at the ends. The plasma discharge is confined to the region above the target surface due to the highly balanced magnetic design. No strong stray electromagnetic fields are generated that promote arcing, substrate damage and heating from electron and ion bombardment and sputtering of the source itself. Flange mount, internal mount and retrofit configurations are available with a variety of feedthrough and utility connection possibilities.

Materials Science, Inc.
San Diego, CA
http://www.msi-pse.com/
Tel: 1-858-483-3223
Email: jmiller@msi-pse.com

Materials Science Ion™ Series DC Magnetron Sputtering and Substrate Bias Power Supplies

Materials Science, Inc. offers the Ion™ Series DC Magnetron Sputtering Power Supplies in 500, 1000 & 1500 watt versions with stable, reproducible operation down to 20 watts for non-reactive processes. Ion Series power supplies provide equivalent or better performance than pulsed DC supplies in most reactive sputtering processes. They feature the industry best performance features including < 100 ns (0.1 ?s) arc detection response time & suppression capability (much faster than any competing power supplies) - arc detection delay and arc off time are both adjustable. This enables the use of these cost-effective power supplies for reactive sputtering. They are also suitable for use as a substrate bias power supply without modi cation. Output power is rated at a power factor of >.98. No transformer tap changes are necessary to operate across the entire 0-1000V rated current range. The Ion™ Series can be run in voltage, current & power regulation modes. Other features include adjustable power ramping, adjustable run timer, stored target parameters for up to 7 separate targets, kWHr count and time limit. Analog and RS-232 communication capability is included. They come in a compact 1U high 19” rack mount chassis. The Ion™ Series is made in the USA and is warranted for 2 years. They are CE compliant. Software updates and modifications can be made by the user through the RS-232 port.

Materials Science, Inc.
San Diego, CA
http://www.msi-pse.com/
Tel: 1-858-483-3223
Email: jmiller@msi-pse.com

MSI SunSource™ GEN II Round Magnetron Sputtering Sources

Materials Science, Inc. SunSource™ round sputtering sources are available in internal and flange mount configurations with 4” to 8” diameter targets. Internal sources have a modular design—Tilt, Adjustable Height and Position, Shutter Mechanism and Mounting Flange/Feedthrough easily configured and later added to using industry standard fittings and components. It is user friendly and serviceable. Gas injection through the cathode body makes additional feedthroughs & manifolds unnecessary and allows low 10-4 Torr range operation. An active plasma discharge on nearly entire target surface significantly reduces insulating lm growth and arcing and promotes stable operation. Target erosion is uniform throughout the target lifetime without significant changes in distribution uniformity as the target erodes. They can be used in DC, pulsed DC, AC and RF modes.

Materials Science, Inc.
San Diego, CA
http://www.msi-pse.com/
Tel: 1-858-483-3223
Email: jmiller@msi-pse.com

MSI SunSourceTM High Target Utilization Sputtering Sources

Materials Science, Inc. SunSource™ round and rectangular sputtering sources feature the highest real target utilization of any planar magnetron available. Utilization varies from 40-45 wt% during the useful target life depending upon the target width and thickness. An active plasma discharge on nearly entire target surface significantly reduces insulating lm growth and arcing and promotes stable operation. Target erosion is uniform throughout the target lifetime without significant changes in distribution uniformity as the target erodes. There is virtually no center re-deposition and the active plasma is confined to the target surface—target clamps and shields are not sputtered and consumed. There are no “wiggles” down the length of the racetrack and no premature burn through at the ends of linear sources.

Materials Science, Inc.
San Diego, CA
http://www.msi-pse.com/
Tel: 1-858-483-3223
Email: jmiller@msi-pse.com