VT&C Catalogs & Literature

VT&C Vacuum Components and Systems Catalog & Literature

8 listings found for: KDF Electronic & Vacuum Services Inc.

KDF—Engineering, Manufacturing and Supporting PVD Tools Brochure

For over 20 years, KDF has been a global leader in engineering, manufacturing, and supporting PVD tools around the world. In 1998 KDF acquired the MRC batch and etch product lines from Tokyo Electron thus increasing our presence in hundreds of fabs and facilities around the world. To meet our customers ever changing business demands and needs, KDF continues to invest in improving the batch product line along with increasing the size of the equipment to accommodate today’s large-scale devices. In 2007 KDF launched the Ci Cluster tool, which has complimented our growing product line of sputter and etch equipment. KDF has positioned itself to serve a host of markets including compound semiconductor, solar PV photovoltaic, flat panel, medical devices, telecomm, RF power, photo mask and a host of other critical military and commercial applications. KDF is the sole source OEM for the MRC batch product line of equipment. We can help sustain your current equipment or supply new sputtering tools that will take your products into the future. Technology and innovation are KDF's charter, and that is why we are the lead producer of batch inline systems.

KDF Electronic & Vacuum Services Inc.
Rockleigh, NJ
http://www.kdf.com/
Tel: Tel: 1-201-784-5005
Email: sales@kdf.com

KDF 844i Large Area Sputtering System

The all new second generation KDF 844i system is a large area vertical system that has increased its handling size to handle the ever increasing demands of the high density interconnect, 300 mm, OLED and flat panel display markets. Despite its increased handling size the system still requires a compact footprint that is less than one third of its competitors. The 844i now utilizes a pallet size of 26.5” × 30” giving it enough capacity to load glass panel substrates up to Gen 3.5. The new 844i system is also now coupled with KDF’s PAT (pallet assist tool). The KDF designed pallet manipulator allows operators to safely handle pallet payloads of up to 150 lb., and its horizontal and vertical movements allow for easy substrate loading as well. The standard tool is integrated and interlocked for both operator and system safety. The new 844i has also been redesigned specifically for thru the wall clean room compatibility as well as having a completely shielded internal chamber area allowing for faster chamber cleaning and less clean room contamination. A user-friendly mobile operator interface cart allows for complete control and system accessibility from any point around the tool. The tool features four 30-inch cathodes that can be chosen from the complete KDF family of in house designed cathodes including the KDF Inset™ and patented full-face erosion LMM™ cathodes. The tool features two processing pallets allowing for instantaneous changes of wafer sizes and the ability to process both the front and backside of the wafer.

KDF Electronic & Vacuum Services Inc.
Rockleigh, NJ
http://www.kdf.com/
Tel: Tel: 1-201-784-5005
Email: sales@kdf.com

KDF 974i Sputtering System with Increased 20 × 20 Inch Pallet Size

The new KDF 974i tool is another KDF innovation which now provides a larger 20” × 20” sputter area. The 974i is an excellent choice for pilot production solar applications, or scaling up production rates from smaller KDF/MRC systems. The 974i is a horizontal configured tool that allows complete end user flexibility to handle unique substrate sizes, and shapes. This type of sputter down application increases and simplifies the uses for the tool since special substrate fixturing is generally not required. Uniformity and utilization are not compromised as KDF maintains the proper pallet to cathode ratio as in all our systems. The base tool is configured with a high vacuum cryo pumped load lock along with heat, allowing for pre heating and faster cycle times. This load lock arrangement coupled along with the four 24” cathodes allows for an array of diversified processes and higher throughput offered in a single tool. The 974i is also available with a host of options to make it even more production specific, available options include but not limited to an integrated process RGA, back side gas cooling in RF etch mode, ERPP™ KDF’s planetary pallet operation, upstream and down stream gas control, as well as pulsed DC bias. All KDF systems utilize the latest in communications control and protocol this along with. KDF’s software Recipe Manager allows for the user to have complete access and control of all the hardware features associated with the tool. The 974i is compatible with and utilizes KDF’s full compliment of 744 specialty cathodes, including the Inset Cathode™, Magterial Cathode™, Mark II Cathode™ along with standard planar cathodes.

KDF Electronic & Vacuum Services Inc.
Rockleigh, NJ
http://www.kdf.com/
Tel: Tel: 1-201-784-5005
Email: sales@kdf.com

KDF 600i Series Sputtering Systems

The KDF 600i Series is targeted towards sensitive applications using both standard materials and those that produce particulate contamination. The 603i, 643i, 643ix, 654i and 654ix tools in this family surpass the criteria for deposition of thin films in high-density devices and other applications requiring absolutely minimal defects. The tools in this family surpass the criteria for deposition of thin films in high-density devices and other applications requiring absolutely minimal defects. The 600 i Series features multi-process sputtering for increased process flexibility and higher throughput. The 643 i’s advanced mechanical and electrical design features result in tight process control, high reliability and extremely low defect rate. Process control features include a palletized batch processing area that allows instantaneous changing of wafer sizes, enabling both front and back side GaAs wafer processing. In addition, a sophisticated temperature control system maintains low wafer temperature during heat sensitive sputtering phase. The 654 i and 654 ix systems were developed for the rapidly growing telecommunications and compound semiconductor markets, the 654 tools can be applied to a full range of leading edge microelectronic component manufacturing applications. The system provides enhanced etch and deposition uniformity and high-speed batch processing. Featuring cathode selectable collimator technology, the 654 ix substantially increases lift-off performance, an enabling sputtering capability that raises the system's overall cost effectiveness. Capable of integration with current systems, the new 654 ix was developed to provide increased volume capacity by enabling multiple substrate material processing, or “multiplexing.”

KDF Electronic & Vacuum Services Inc.
Rockleigh, NJ
https://www.kdf.com/
Tel: Tel: 1-201-784-5005
Email: sales@kdf.com

KDF 744i Large Area, Four-Target, Batch-Sputtering System

Built on the production workhorse 600 platform, the KDF 744i features full 200 mm wafer capability, this allows the tool to perform the workload of four 603i systems saving a significant cost over multiple systems. The large area vertically oriented 744i system is the perfect solution for those particle sensitive processes such as TiW and TaN which have tendencies to generate device damaging particles. Using a pallet size of 19 × 19 inches, a host of substrate sizes can be accommodated with this system. As in all inline KDF systems the user can easily change substrate sizes at will run to run. Despite its tall chamber and 24.5-inch cathodes the 744i has a shortened mainframe assembly that helps make the system operator friendly and ergonomically correct. A heated and hi vacuum load lock is standard on the 744i system, this setup allows the user to pre-heat process pallets in the load lock while sputtering or etch processing another pallet simultaneously in the main system. All KDF systems have full capability to be connected to a customer’s intranet or to the Internet for complete remote access and control. To help insure statistical process control the system has full data log monitoring and reporting capabilities. The 744i system also utilizes KDF's family of in-housed designed cathodes, which covers the full spectrum of materials to be sputtered. KDF's Inset Cathode™ can achieve up to 60% utilization while delivering better then 4 % pallet uniformity. From dielectrics, magnetic materials, or precious metals KDF has a cathode to fit. The KDF 744i is equipped with all the latest in OEM technology like MKS cluster gauges and Advanced Energy Pulsed power supplies. The software features of the tool are extensive, including but not limited too auto cryo regeneration, auto pump and vent, programmable target burn-in, particle test mode, selectable slew modes, multi servo power mode selections, scan profile mode, multipass up to 9999, and repeat recipe mode. With systems installed around the world, the 744i is a production proven and reliable tool.

KDF Electronic & Vacuum Services Inc.
Rockleigh, NJ
http://www.kdf.com/
Tel: Tel: 1-201-784-5005
Email: sales@kdf.com

KDF 943i Compound Semi Sputtering Tool

By far KDF’s most popular and best selling system, the 943i has been improved upon again. This production tool is by far one of the most cost effective tools in the market place today with over 300 hundred of these systems out there KDF has gained recognition of being a superior tool supplier. With a 12 x 12 inch pallet area this tool allows simple orientation to substrates with next to no fixturing or holders, this makes this tool extremely simple for odd or irregular shaped substrates. The 943i is a perfect fit for R&D or full production needs, with extensive recipe manager and overall tool configuration possibilities this system can perform any task. The tool is standard equipped for both up and down stream process gas controls, it is plug and play for additional gas's in the field, or just changing gas ranges. KDF software platform is like no other with an OEM configuration page that builds the system as per the customers needs. The standard software package allows the customer such attributes of choosing KW voltage or current control for DC operation, or by letting the user choose kW, kV or Load Power control for RF operation. KDF maintenance screens allow total automation in Target burn in, while keeping complete track of all KW hours. To take full advantage of suppliers hardware KDF incorporates R3232, RS485 and Ethernet IP to allow full interfaces to products and being able to view and change parameters interactively. KDF's large Cathode selection allows this tool to be extremely versatile, KDF also offers our exclusive ix Series of cathodes with measures 5 × 17 inches, allowing for more improved uniformities without shields or apertures. KDF’s Inset Cathodes™, Planer Mag, Planer Diodes, Magterial™, and LMM™ [full face erosion] cathodes are all offered in this size as well. The ERRP™ or planetary pallet offers uniformities better then 1% and 0.5% run to run. 

KDF Electronic & Vacuum Services Inc.
Rockleigh, NJ
http://www.kdf.com/
Tel: Tel: 1-201-784-5005
Email: sales@kdf.com

KDF 8620i 3 Target Sequential RF Sputtering System

The KDF 8620i system is a 3 target sequential RF sputtering system. The base system is a turnkey system that offer three 6-inch RF diode targets along with RF etch and RF bias. The 8620i is a manually loaded batch tool that is excellent for R&D as well as small-scale production. This tool is run by a PLC control system coupled to a touch screen panel for simplistic operation. The standard tool is CTI cryo pumped and has all automated features for pump down, vent and cryo regeneration. The 8620i also has an adjustable anode to cathode distance allowing even for more flexibility in process development. A full package of both MKS gauges and control instruments coupled with a VAT throttling gate valve provides precise control of both upstream and downstream pressure control. This system package provides precise control and flexibility for all your process gas needs.

KDF Electronic & Vacuum Services Inc.
Rockleigh, NJ
http://www.kdf.com/
Tel: Tel: 1-201-784-5005
Email: sales@kdf.com

KDF Ci Cluster Tool Literature

After years of development and testing, KDF is proud to announce the release of its new cluster tool line, called Ci for Cluster Intelligence. The Ci tools will be offered in a four sided and eight sided package, both system types will feature Brooks Marathon series vacuum handlers. Depending on the application system will be populated as dictated by the process. The Ci is designed for a variety of niche market places including compound semiconductor, DWDM components, MEMS, MOEMS, sensors, Nanotechnology and advanced packaging production with substrate sizes up to 200 mm. The KDF tool is a cost effective means of entering or sustaining today’s high yield high throughput requirements. With over twenty years of manufacturing and engineering expertise KDF is confident that this tool will out perform others in its class without the high cost of other OEM’s. This tool can be run with custom wafer carriers if required, or can configured from 4 to 8 inch wafers as ordered.

KDF Electronic & Vacuum Services Inc.
Rockleigh, NJ
http://www.kdf.com/
Tel: Tel: 1-201-784-5005
Email: sales@kdf.com