Vacuum Pressure Measurement Standards Part 1
Steve Hansen
Nearly 100 years ago, a discovery revolutionized light microscopy. The introduction of the phase-contrast microscope, which garnered a Nobel Prize in 1953, brought into clear view structures inside cells that had previously been too faint or washed out for biologists to study. (Read for more)
Researchers with the Department of Energy’s Oak Ridge National Laboratory and the University of Tennessee, Knoxville, have created an innovative method to visualize and analyze atomic structures within specially designed, ultrathin bilayer 2D materials. When precisely aligned at an angle, these materials exhibit unique properties that could lead to advancements in quantum computing, superconductors and ultraefficient electronics. (Click for More)
Secondary Ion Mass Spectrometry is a surface analysis technique known for high sensitivity and excellent depth resolution in the analysis of solid materials. It is frequently used to monitor impurities like dopants in semiconductors and contamination at interfaces in the production of thin films, such as solar cells. In these applications different elements are monitored. (read for more)
Buffalo, N.Y. – 26 May, 2026 – Allient Inc. (Nasdaq: ALNT) (“Allient” or the “Company”), a global designer and manufacturer of specialty Motion, Controls, and Power products and solutions for targeted industries and applications, has today announced it will showcase its advanced motion solutions at Robotics Summit & Expo 2026, taking place May 27–28 at the Boston Convention and Exhibition Center in Boston, Massachusetts. (Click for More)
Since 2000 Vacuum Technology & Coating Magazine has been the industry's leading source for the latest articles, news, and product and service information. Below we describe some of the terms that you will find in a typical issue of VT&C.
Vacuum Coating (Vacuum Deposition and Thin Film Deposition) is the process of depositing a film or other material atom by atom or molecule by molecule onto a surface in a low pressure environment or vacuum.
Physical Vapor Deposition or PVD refers to vacuum deposition methods which involve the material (which is being deposited) going from a condensed phase to a vapor phase and then to a thin film condensed phase. Sputtering and evaporation are common PVD processes.
Sputtering refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from a target source.
Evaporation refers to the heated source material being evaporated in a vacuum. Vacuum allows vapor particles to travel directly to the target object, where they condense back to a solid state. (called a Deposition Source) refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from the target source (called a Deposition Source).
Vacuum Hardware refers to the types of hardware and components that are used in the vacuum process. There are many types of hardware used in this process, some examples are flanges, fittings, seals, valves, and chambers.
Thin Film Metrology involves determining the optimal thickness, composition and/or condition of a coating through various techniques and mathematical calculations.
Gas Analytical Systems are used in the analysis of residual gases within a low pressure environment or vacuum.
Vacuum Pumps are devices that remove gas atoms and molecules for the purpose of leaving behind a partial vacuum. Some examples of types of vacuum pumps are rotary vane pumps, diaphragm pumps, and scroll pumps.
Every issue of VT&C includes a product showcase focused on a specific topic relevant to Vacuum Processing, please see our 2026 editorial calendar which lists the topic for each issue.
