Scientists have demonstrated a new material that conducts heat 150% more efficiently than conventional materials used in advanced chip technologies. The device – an ultrathin silicon nanowire – could enable smaller, faster microelectronics with a heat-transfer-efficiency that surpasses current technologies. Electronic devices powered by microchips that efficiently dissipate heat would in turn consume less energy – an improvement that could help mitigate the consumption of energy produced by burning carbon-rich fossil fuels that have contributed to global warming.
Hiden Analytical develops and supplies instruments for a new era of analysis of ions, radicals and neutrals from high pressure plasmas. The latest in the range of application showcase brochures, Atmospheric Plasma Applications, offers an insight into the applications that Hiden’s atmospheric plasma range address. The Hiden instruments for atmospheric plasma analysis include the HPR-60 MBMS as well as the HPR-20 R&D gas analysis range. The HPR-60 system is a specialised system, developed specifically for direct measurement of atmospheric plasma species. The HPR-20 R&D allows for real time gas analysis of neutral products from plasma, effective in plasma catalysis applications.
McLean, Va. and Bedford, Mass., February 9, 2022 – MITRE, MIT, and Sandia National Laboratories are collaborating on a moonshot effort to build a quantum computer and recently published experimental findings in Nature Photonics.
Hiden Analytical introduce the HPR-30 Series quadrupole analysers for vacuum process analysis.
The Hiden HPR-30 Series are bolt on vacuum process analysers designed for fast response, high sensitivity analysis of gas and vapour species. Equipped with Hiden’s multi-level software package, offering simple control of mass spectrometer parameters and complex manipulation of data and control of external devices. Applications include leak detection, contamination monitoring, process trend analysis and analysis of high mass species and precursors used in ALD and MOCVD.
Since 2000 Vacuum Technology & Coating Magazine has been the industry's leading source for the latest articles, news, and product and service information. Below we describe some of the terms that you will find in a typical issue of VT&C.
Vacuum Coating (Vacuum Deposition and Thin Film Deposition) is the process of depositing a film or other material atom by atom or molecule by molecule onto a surface in a low pressure environment or vacuum.
Physical Vapor Deposition or PVD refers to vacuum deposition methods which involve the material (which is being deposited) going from a condensed phase to a vapor phase and then to a thin film condensed phase. Sputtering and evaporation are common PVD processes.
Sputtering refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from a target source.
Evaporation refers to the heated source material being evaporated in a vacuum. Vacuum allows vapor particles to travel directly to the target object, where they condense back to a solid state. (called a Deposition Source) refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from the target source (called a Deposition Source).
Vacuum Hardware refers to the types of hardware and components that are used in the vacuum process. There are many types of hardware used in this process, some examples are flanges, fittings, seals, valves, and chambers.
Thin Film Metrology involves determining the optimal thickness, composition and/or condition of a coating through various techniques and mathematical calculations.
Gas Analytical Systems are used in the analysis of residual gases within a low pressure environment or vacuum.
Vacuum Pumps are devices that remove gas atoms and molecules for the purpose of leaving behind a partial vacuum. Some examples of types of vacuum pumps are rotary vane pumps, diaphragm pumps, and scroll pumps.
Every issue of VT&C includes a product showcase focused on a specific topic relevant to Vacuum Processing, please see our editorial calendar which lists the topic for each issue.