Emergence of Flexible Photonic Crystals
Steve Hansen
Since its founding in 2010, the Joint Center for Artificial Photosynthesis (JCAP) has made significant progress in the pursuit of a sustainable energy industry that converts sunlight, water, and carbon dioxide into renewable transportation fuels. JCAP is a U.S. Department of Energy (DOE) Innovation Hub led by the California Institute of Technology (Caltech) and based partly at DOE’s Lawrence Berkeley National Laboratory (Berkeley Lab).
OAK RIDGE, Tenn., Feb. 27, 2020 — Researchers at Oak Ridge National Laboratory and the University of Tennessee achieved a rare look at the inner workings of polymer self-assembly at an oil-water interface to advance materials for neuromorphic computing and bio-inspired technologies. Results published in the Journal of the American Chemical Society provide new insights on the way molecules pack and order themselves into “tunable” interfaces, monolayer thick surfaces with structures that can be modified for specific functionalities.
OAK RIDGE, Tenn., Feb. 11, 2020 — Thomas Kurfess, chief manufacturing officer and senior distinguished scientist for manufacturing at the Department of Energy’s Oak Ridge National Laboratory, has been elected a member of the National Academy of Engineers for his contributions to innovative digital manufacturing technologies and system architectures.
Andover, Mass., – February 11, 2020 – MKS Instruments, Inc. (NASDAQ: MKSI), a global provider of technologies that enable advanced processes and improve productivity, today announced the release of its next generation Series 49UL Thermal Management System for Semiconductor, Analytic and Advanced markets.
Since 2000 Vacuum Technology & Coating Magazine has been the industry's leading source for the latest articles, news, and product and service information. Below we describe some of the terms that you will find in a typical issue of VT&C.
Vacuum Coating (Vacuum Deposition and Thin Film Deposition) is the process of depositing a film or other material atom by atom or molecule by molecule onto a surface in a low pressure environment or vacuum.
Physical Vapor Deposition or PVD refers to vacuum deposition methods which involve the material (which is being deposited) going from a condensed phase to a vapor phase and then to a thin film condensed phase. Sputtering and evaporation are common PVD processes.
Sputtering refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from a target source.
Evaporation refers to the heated source material being evaporated in a vacuum. Vacuum allows vapor particles to travel directly to the target object, where they condense back to a solid state. (called a Deposition Source) refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from the target source (called a Deposition Source).
Vacuum Hardware refers to the types of hardware and components that are used in the vacuum process. There are many types of hardware used in this process, some examples are flanges, fittings, seals, valves, and chambers.
Thin Film Metrology involves determining the optimal thickness, composition and/or condition of a coating through various techniques and mathematical calculations.
Gas Analytical Systems are used in the analysis of residual gases within a low pressure environment or vacuum.
Vacuum Pumps are devices that remove gas atoms and molecules for the purpose of leaving behind a partial vacuum. Some examples of types of vacuum pumps are rotary vane pumps, diaphragm pumps, and scroll pumps.
Every issue of VT&C includes a product showcase focused on a specific topic relevant to Vacuum Processing, please see our editorial calendar which lists the topic for each issue.
